Abstract

ZnMgO thin films were prepared on Si substrates by aerosol deposition method using zinc acetate and magnesium acetate as precursors. The obtained films were investigated by scanning electron microscopy (SEM), energy dispersive xray (EDX) and X-Ray Diffraction (XRD) analysis. SEM and EDX investigations showed that the produced thin films are homogeneous from the point of view of morphology and composition. The investigation of photosensitivity demonstrated that the heterostructures of ZnMgO thin films deposited on Si substrates are sensitive in a wide spectral range from ultraviolet (UV) to infrared (IR) radiation, with a highest sensitivity in the UV region.

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