Abstract
AbstractA series of p‐dimethylaminobenzylidene derivatives was able to sensitize the photodecomposition of diphenyliodonium salt to afford highly photosensitive negative‐type resins. When a polymer‐bearing methacryloylated group in the side chain was sensitized with a combination of the p‐dimethylaminobenzylidene compounds and the iodonium salt, the polymer demonstrated high sensitivity even to 488 nm light emitted from an Argon laser. The same photoinitiator systems were applicable to insolubilize poly(glycidyl methacrylate) through cationic photopolymerization. The storage stability of these types of photoinitiators depends on the structure of the benzylidene compounds; decreasing the basicity of the amino group enhanced the thermal stability.
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