Photosensitive polybenzoxazole based on a poly(o‐hydroxy amide), a dissolution inhibitor, and a photoacid generator

Abstract

AbstractA positive‐type photosensitive polybenzoxazole (PSPBO), based on a poly(o‐hydroxy amide) (PHA), the dissolution inhibitor (DI) 9,9‐bis(4‐tert‐butoxycarbonyloxyphenyl)fluorene (t‐Boc BHF), and the photoacid generator (5‐propylsulfonyloxyimino‐5H‐thiophene‐2‐ylidene)‐(2‐methylphenyl)acetonitrile (PTMA), was developed. Several new tert‐butoxycarbonylated compounds as DIs for PSPBOs were prepared from phenolic compounds having a cardolike structure with di‐tert‐butyl dicarbonate in the presence of 4‐dimethylaminopyridine. Among them, t‐Boc BHF and 5,5′,6,6′‐tetra(tert‐butoxycarbonyl)‐3,3,3′,3′‐tetramethyl‐1,1′‐spirobiindane acted as excellent DIs, giving a large dissolution contrast between the exposed and unexposed areas in a 2.38 wt % tetramethylammonium hydroxide solution (TMAHaq)/5 wt % iso‐propanol (i‐PrOH). The dissolution behavior of this PSPBO system was studied in relation to the PTMA and t‐Boc BHF loadings and postexposure baking temperature. A PSPBO consisting of PHA (77 wt %), t‐Boc BHF (20 wt %), and PTMA (3 wt %) exhibited a sensitivity of 34 mJ/cm2 and a contrast of 5.8 when exposed to 365‐nm light (i‐line) and developed with an aqueous alkaline developer, 2.38 wt % TMAHaq/5 wt % i‐PrOH. A clear, positive image with 6‐μm features and a 10‐μm‐thick pattern with high sensitivity and contrast was produced by contact printing and converted into polybenzoxazole patterns upon heating at 350 °C for 1 h. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 661–668, 2007