Abstract
AbstractNovel photocrosslinkable poly(ether sulfone)s copolymers with allyl pendants (AS-PES) have been synthesized from 3,3’-diallyl-4,4’-dihydroxydiphenyl sulfone (DA-DHDPS), 4,4’-dihydroxydiphenyl sulfone (DHDPS) and 4,4’- dichlorophenylsulfone (DCDPS). The resulting polymers could be photocrosslinked in the presence of thiol at room temperature. The crosslinking process was monitored by “Real Time Fourier Transform Infrared Spectroscopy” (RTIR). It proves that a small amount (1.0 wt%) of the thiol crosslinker addition is sufficient to form a chemical network under UV irradiation. After UV curing, AS-PES-20 coating showed high Tg, good thermal stability and excellent resistance to the acid, salt, and alkali. Accordingly, this method could successfully provide a new approach to make rapidly photocrosslinking poly(ether sulfone) coatings without losing their good thermal properties.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
