Abstract
Photochemical initiation of polymerization by visible or broadband ultraviolet irradiation of a mixture of 1,4-(bis-chlorotetrafluoro-λ6-sulfanyl) benzene and 1,4-diethynyl benzene forms light responsive polymers. The novel polymers have a trans-tetrafluoro-λ6-sulfanyl (tetrafluorosulfanyl, SF4) group backbone and are sensitive to electron beam (EB) and extreme ultraviolet (EUV) irradiation. Both EB lithography and EUV contrast experiments demonstrate the sensitivity of the polymer films to short wavelength irradiation.
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