Abstract
Photoresponsive Polymer Films with Micropatternable Surfaces In article number 2101965, Takafumi Noguchi, Takashi Miyata, and co-workers develop photoresponsive polymer films with directly micropatternable surfaces formed by only UV exposure without the development process using solvents. Micropatterns are formed on the film surfaces by only UV exposure using photomasks. The micropatterns are achieved due to the decrease in the film thickness with a decrease in the free volume, induced by photo-crosslinking.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
