Abstract
The photoelectrochemical responses of two archetypal metal–organic frameworks (MOFs), MOF-5 and MOF-177, have been assessed. Films of MOF-5 and MOF-177 were grown on carboxylic-acid-terminated conductive fluorine-doped tin oxide substrates. Separate analyses by powder X-ray diffraction, Raman spectroscopy, and fluorescence spectroscopy collectively indicated these films prepared via a solvothermal method in diethylformamide were free of residual impurities such as ZnO clusters and residual organics. Exposure of these films to white light illumination while immersed in acetonitrile electrolytes elicited measurable photocurrents. Wavelength-dependent analysis of the photoresponses showed that the measured photocurrents were induced by ultraviolet light and that the spectral response profiles followed closely the light absorption profiles of each respective material. Attenuation of the induced photocurrents was noted after prolonged ultraviolet light illumination and/or exposure of the films to H2O(l), indicating that the observed photoresponse properties are directly related to the structural integrity of these MOFs. The cumulative data illustrate that such MOFs have innately light-sensitive properties that are atypical in high surface area materials.
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