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Abstract
The photopolymerzation property of a novel benzophenone derivative photoinitiator containing Si (HBSiBH) was investigated by real-time FTIR (RTIR) and X-ray photoelectron spectroscopy (XPS). It is noted that both of the polymerization rate and final conversion of the system increased with increase concentration of HBSiBH. Addition of small amount of HBSiBH can greatly improved the photopolymerization rate of radical photopolymerization. XPS experiment showed that the new photoinitiator containing Si had ability to float up to the surface of UV-curable system. It could more effectively mitigate inhibition of oxygen in radical photopolymerization and provide a new approach to improving surface performance of UV-curable materials.
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