Photopatterning of self-assembled poly (ethylene) glycol monolayer for neuronal network fabrication

Abstract

The ability to culture individual neurons and direct their connections on functional interfaces provides a platform for investigating information processing in neuronal networks. Numerous methods have been used to design ordered neuronal networks on microelectrode arrays (MEAs) for neuronal electrical activities recording. However, so far, no method has been implemented, which simultaneously provides high-resolution neuronal patterns and low-impedance microelectrode. To achieve this goal, we employed a chemical vapor-deposited, non-fouling poly (ethylene) glycol (PEG) self-assembled monolayer to provide a cell repellant background on the MEAs. Photolithography, together with plasma etching of the PEG monolayer, was used to fabricate different patterns on MEAs. No electrode performance degradation was observed after the whole process. Dissociated cortical neurons were cultured on the modified MEAs, and the patterns were maintained for more than 3 weeks. Spontaneous and evoked neuronal activities were recorded. All of the results demonstrate this surface engineering strategy allows successful patterning of neurons on MEAs, and is useful for future studies of information processing in defined neuronal networks on a chip.