Photooxidation of plasma polymerized polydimethylsiloxane film by 172nm vacuum ultraviolet light irradiation in dilute oxygen

Abstract

Plasma polymerized polydimethylsiloxane films irradiated under different partial pressures of oxygen with a 172nm vacuum ultraviolet light were investigated in order to clarify the roles of molecular oxygen and photons in photooxidation. The thickness, densities, surface roughness, elemental compositions, and molecular structures of the irradiated and unirradiated films were examined by using glazing incidence x-ray reflectivity, Rutherford backscattering, infrared, and x-ray absorption (XAS) spectroscopies. Photooxidation is hardly promoted by irradiation in a high vacuum of 1×10−4Pa, though photodesorption of the methyl group and formation of Si–H bonds were observed. Silica films thicker than 140nm were formed at room temperature by irradiating them in low pressure oxygen gases. The degree of oxidation was smaller for the oxygen pressure of 10kPa than for 83Pa. Si K-edge XAS was performed to clarify the change of coordination environment of silicon by photooxidation in dilute oxygen flow containing less than 5ppm of molecular oxygen.