Photonic metamaterials new opportunities for nanoimprint

Abstract

This article presents a short discussion on the fabrication of photonic metamaterials. The method of choice for fabricating metamaterials is still electron beam lithography despite its intrinsic drawbacks like long writing time and high operation costs. Thus only small areas can be structured within reasonable time and at reasonable costs. Another way to fabricate high-quality photonic metamaterials on a macroscopic scale is provided by interference lithography which allows structuring huge areas. Another promising technique to achieve large-scale, high-quality metamaterials is nanoimprint lithography, which was recently applied to fabricate photonic metamaterials.