Abstract
We describe broad new classes of three-dimensional (3D) structures which, when made of silicon, exhibit robust 3D photonic band gaps of up to 25% of the gap center frequency. The proposed photonic crystals are readily amenable to very high precision microfabrication using established techniques such as x-ray lithography and template inversion. Each architecture consists of a set of oriented cylindrical pores emanating from a two-dimensional (2D) square lattice mask with a two-point basis. Large bandwidth, microcircuits for light may be incorporated within the resulting photonic band gaps using an intercalated 2D photonic crystal layer.
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