Abstract
Various aspects of photon-matter interactions are discussed in the frame of applications to chemical vapor deposition processes. Based on the examples of carbon and tungsten deposition, the influences of photon sources like lamps, pulsed- or cw-lasers on the deposition mechanisms are outlined. Peculiarities arising from the different interactions of photons with the gas phase and/or the substrate surface and their effect on the compositional or structural characteristics of the deposited material are described.
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