Abstract
Light-emitting devices of modern photonics are based on the semiconductor structures containing layers with various physical parameters. To preserve initial parameters during focused ion beam (FIB) lithography, it is necessary to take into account the processes of radiation defect formation. Radiation-induced defects in target play role of nonradiative recombination centers leading to photoluminescence (PL) quenching. In our work, the FIB impact on the photoluminescence were examined using PL spectroscopy of milled Al0.18Ga0.82As/GaAs double heterostructure. In order to exclude photoexcited carriers losses in emitter layer, an experiment with subbarrier photoexcitation was organized. Finally, we compare our experimental findings with theoretical data proposed by stopping and range of ions in matter (SRIM) calculation.
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