Abstract

ZnO thin film was successfully deposited on different substrate by sol-gel spin coating. Zinc acetate dihydrates, diethanolamine and isopropyl were used as starting material, stabilizer and solvent respectively. Two different substrate used in this work are p-type silicon wafer and porous silicon. Porous silicon was prepared by electrochemical etching. In order to study the surface morphology, field emission scanning electron microscopy (FESEM) was employed. It is found that, ZnO thin film was composed by ZnO nanoparticles. The averages size ZnO nanoparticle is 23.5 nm on silicon and 17.76 nm on porous silicon. Based on Atomic Force Microscopy (AFM) topology analysis, surface of ZnO thin films on porous silicon was rougher compared to ZnO thin films on silicon due to substrate surface effect. Photoluminescence spectra shows two peaks are appear for ZnO thin film on silicon and three peaks are appear for ZnO thin film on porous silicon. PL spectra peaks of ZnO thin film on silicon are correspond to ZnO and ZnO native defects while peaks of PL spectra on porous silicon are corresponds to ZnO, ZnO native defects and porous silicon.

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