Abstract
Single GaAs/AlxGa1−xAs quantum wells, grown by molecular beam epitaxy with growth interruptions at each interface, are investigated using low-temperature photoluminescence. The three clearly resolved photoluminescence peaks are attributed to discrete monolayer thicknesses of the well. The splitting of the peaks is investigated for several hundred points across a 2 in. wafer. The negligible variation of the peak splitting is consistent with abrupt interfaces in the growth direction, atomically smooth interfaces, and discrete thicknesses of the quantum well with changes of only integer multiples of monolayers.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.