Abstract
We report on photoluminescence (PL) properties of GaN, GaN:Yb, InGaN, and InGaN:Yb thin films grown on (0001) sapphire substrates by plasma assisted molecular beam epitaxy (MBE). X-ray diffraction pattern of the films confirms c-axis oriented growth. The concentration of Yb and In was obtained by X-ray photoelectron spectroscopy (XPS) and was found to be 5 (± 0.5) at.% and 30 (± 1.5) at.%, respectively. The GaN:Yb and InGaN:Yb thin films show a significant linewidth narrowing in PL spectra compared to GaN and InGaN thin films. This could be attributed to the reduction of the defect related non-radiative recombination paths and suppression of the structural defects and dislocations because of the in situ rare earth (Yb)-doping during the growth. The temperature dependent photoluminescence of GaN:Yb thin film follows the Varshni model, whereas InGaN:Yb film shows a complex S-shaped like behavior, which can be explained by the localization effect using the Band-Tail model.
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