Abstract
A new photo-lithographic imaging (PLI) method to produce high efficiency volume phase-only CGH has been developed. PLI technique utilizes Du Pont proprietary materials and processes to replicate a binary intensity CGH, recorded on a chrome photomask-master, into a dry photopolymer. By changing the refractive index of the photopolymer in the imaged areas the intensity modulated pattern in the chrome photomask-master is converted into a volume phase modulated pattern with a single lithographic step. This technique was used to fabricate a variety of computer generated holographic optical element (CGHOE), such as on-axis and off- axis Fresnel zone plates and array illuminators. Diffraction efficiencies up to 98% were observed for a CGHOE consisting of a 10 X 10 array of off-axis Fresnel zone plates. Such CGHOEs can be fabricated on a variety of substrates and in different configurations, providing substantial technological and economical advantages over existing conventional manufacturing techniques for diffractive binary CGHOEs.
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