Abstract
The photosensitivity of the photosurface deposition (PSD) effect and the durability in air of Agx(Ge0.3S0.7)100−x films (40⩽x⩽83) with thicknesses of 50–700 nm have been studied. Films of 60–65 at. % Ag and 200–300 nm thick were found to be optimal for applications in optical recording devices. Crystallized samples have been examined to obtain structural information on the Ag-rich films. It is suggested that excess Ag+ ions, which contribute to the PSD, exist in a disordered Ag8GeS6 phase of the Ag-rich films.
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