Abstract
In this paper the possibility of using the novel polymeric photosensitive medium for the fabrication of integrated optics elements was demonstrated. The medium is based on PMMA doped by 2,2-difluoro-4-(9-anthracyl)-6-methyl-1,3,2-dioksaborine. Planar and strip waveguides with the attenuation losses less than 2dB/cm were fabricated in the layer of the medium. The photoinduced recording of the diffraction grating with the spatial frequency up to 2500mm−1 and diffraction efficiency ~5% in such waveguides was demonstrated. The possibility to improve the diffraction efficiency of recorded gratings up to 47% by chemical treatment was demonstrated.
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