Photoinduced mass transport in amorphous As‐S‐Se films

Abstract

AbstractDirect surface patterning due to photoinduced mass transport in amorphous As‐S‐Se films has been studied. Illumination of the films with two orthogonally (±45°) polarized beam interference pattern causes the formation of surface relief gratings on the films due to lateral mass transport regarding to light propagation direction. The obtained experimental results showed the dependence of photoinduced surface relief depth (Δh) on film thickness during holographic recording from film side as well as from glass substrate side. After constant exposure doses for the films with a thickness d < 1 μm a strong dependence of Δh on film thickness was observed. For films with a thickness d > 1 μm values of Δh do not depend significantly on the film thickness for recording from film side but decrease rapidly for recording from opposite side. The studies of the surface relief grating formation dependence on the film thickness show that all illuminated film volume is involved in mass transport process (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)