Abstract
Cleavage of the strong carbon-fluorine bonds is critical for elimination of perfluorooctanoic acid (PFOA) from the environment. In this work, we investigated the decomposition of PFOA with the SiC/graphene catalyst under UV light irradiation. The decomposition rate constant (k) with SiC/graphene was 0.096 h(-1), 2.2 times higher than that with commercial nano-TiO2. Surface fluorination on SiC/graphene was analyzed by X-ray photoelectron spectroscopy (XPS), revealing the conversions of Si-H bonds into Si-F bonds. A different route was found to generate the reactive Si-H bonds on SiC/graphene, substituting for silylium (R3Si(+)) to activate C-F bonds. During the activation process, photogenerated electrons on SiC transfer rapidly to perfluoroalkyl groups by the medium of graphene, further reducing the electron cloud density of C-F bonds to promote the activation. The hydrogen-containing hydrodefluorination intermediates including (CF3(CF2)2CFH, CF3(CF2)3CH2, CF3(CF2)4CH2, and CF3(CF2)4CFHCOOH) were detected to verify the hydrodefluorination process. The photoinduced hydrodefluorination mechanisms of PFOA can be consequently inferred as follows: (1) fluorine atoms in perfluoroalkyl groups were replaced by hydrogen atoms due to the nucleophilic substitution reaction via the Si-H/C-F redistribution, and (2) generation of CH2 carbene from the hydrogen-containing perfluoroalkyl groups and the C-C bonds scission by the Photo-Kolbe decarboxylation reaction under UV light excitation. This photoinduced hydrodefluorination provides insight into the photocatalytic decomposition of perfluorocarboxylic acids (PFCAs) in an aqueous environment.
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