Abstract
Very thin nanostructured carbon films were deposited on quartz substrate by reactive magnetron sputtering using graphite target and gas mixture of Ar and reactive gas N_2 or N_2+H_2. Film thicknesses were in the range of 20-25 nm. Rutherford backscattering spectrometry and Elastic recoil detection analytical method determined the concentration of elements in the films. Scanning electron microscopy scanned the surface morphology of carbon films. Raman spectroscopy was used for chemical structural properties determination of very thin carbon films. Raman spectra intensities were fitted with Gaussian peaks. The photo-induced (pulsed laser - 266 nm) electron emission properties of very thin nanostructured carbon films were investigated by the measurement of cathode bunch charge at different electric field and calculate quantum efficiency. The influence of different electric field on the photo-induced electron emission characteristics of prepared transmission photocathodes are discussed.
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