Photo-Fenton degradation of non-ionic surfactant and its mixture with cationic or anionic surfactant

Abstract

The oxidative degradation of non-ionic surfactants by the photo-Fenton process has been examined. The photo-Fenton degradation kinetics of mixtures of non-ionic surfactant and other type surfactants has been also investigated since mixtures of non-ionic and ionic surfactants are commonly used to utilize their synergistic effects in many practices. Effects of operating parameters such as dosages of Fenton reagents (iron and hydrogen peroxide) and UV light intensity on the degradation of commercial non-ionic surfactant Sannonic SS-90 (polyoxyethylene alkyl ether) were studied. Although the dosages of the Fenton reagents increased the degradation rate up to the optimum dosages, further addition of the reagents could not enhance the degradation rate. Excess dosages of Fe and H2O2 caused excess OH radicals which could be a scavenger of OH radicals and as a result could not enhance the degradation of the surfactant. The increase in UV light intensity resulting in the faster photo-Fenton process or the enhancement of OH radical formation rate led to the increase in degradation rate of non-ionic surfactant. Although the existence of the anionic surfactant (sodium dodecylbenzene sulphonate) would inhibit the degradation of the non-ionic surfactant due to the formation of complex with Fe ion, the existence of cationic surfactant (dodecyltrimethyl ammonium chloride) affected insignificantly the photo-Fenton degradation process of the non-ionic surfactant.