Abstract
Ultrafine nickel particles are produced in ultrapure helium. The measured photothreshold and photoelectric yield of clean nickel particles are found to be in fairly good agreement with theoretical calculations based on a three-step model using density-of-states data of a flat surface. The photothreshold change due to oxygen adsorption on nickel particles was measured. It shows qualitatively the same behavior as on a flat surface but with a sticking coefficient that is smaller by a factor of 500 compared with the one on a flat Ni(110) surface. The formation of NiO is found to influence the experiment at high surface coverage.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
