Photo-emission electron gun and electron optical simulation for ultrafast scanning electron microscope

Abstract

Ultrafast scanning electron microscope (USEM) integrates pump-probe technique with microscopic imaging, enabling the visualizing of photon-induced surface charge dynamics with high spatial and temporal resolution. This capability is crucial for high-resolution detection of semiconductor surface states and optoelectronic devices. This work discusses the parametric design of a thermionic emission electron gun that has been modified into a photoemission electron gun, based on a home-built ultrafast scanning electron microscope. Given that the dose of the photoemitting electron beam is usually much lower than that of thermionic emission, the transition to photoemission requires the removal of the self-bias voltage function of the original electron microscope power supply to ensure the normal operation of the Wehnelt electrode. We quantitatively analyze the dependence of bias voltage, cathode, Wehnelt electrode, and anode on the position, size and divergence angle of crossover, which helps to improve the parameter adjustment of the modified electron gun. The analysis results indicate that if the distance between the Wehnelt electrode and the anode is adjusted from 8 to 23 mm, the distance between the filament and wehnelt can be changes from 0.65 to 0.45 mm to cooperate with the bias adjustment, so that the normal use of high-resolution thermionic emission mode, low voltage mode and photoemission mode can be realized. Subsequently, the effect of the mirror’s position on the electron optical path is analyzed. It is found that when the anode is raised 1.4 mm above the mirror, the influence on the electron optical path can be ignored. Additionally, the zero-of-time and temporal broadening of the photo-electron pulse are further simulated. The results indicate that with the increase of bias voltage, the time zero of photoemission will be delayed and the temporal broadening will become larger. This study lays a foundation for the future development of ultrafast electron microscope and the design of photoemission electron sources.