Abstract
Photoelectron spectroscopy using standing waves generated by a reflection multilayer is an effective method for investigating electronic and/or chemical structures at interfaces. Changes in photoelectron spectra are difficult to measure when the standing wave phase is changed, because no known method exists to measure phases in situ. In this study however, we present a method to measure the phases of standing waves in situ by combining the reflection and total electron yield spectra. The photoelectron spectra of Fe/Si/Fe trilayers deposited on a Mo/Si reflection multilayer were demonstrated by the phase results.
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