Abstract
X-ray photoelectron diffraction patterns of Cs 3d core levels for the full-Cs-coverage Si(001)-2 × 1-Cs surface have been measured and analyzed kinematically. It is found from the analysis that one monolayer of Cs, i.e., Cs/surface-Si ratio of unity, is present over the substrate forming a double-layer (upper and lower) array of atoms. The arrangement of Cs atoms in the double layer is essentially the same as the K double layer for the Si(001)2 × 1-K surface. New surface orders are reported that can be formed by the deposition of Cs or K atoms onto an annealed Si(001) substrate.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
