Abstract
Thin films of hematite, synthesized by electrodeposition were irradiated by 100 Mev Si8+ swift heavy ions (SHI) at various fluences. The grain size, surface morphology, optical absorption edge, capacitance measurements and photoelectrochemical response of these films were studied and analyzed before and after exposure to irradiation. Irradiated samples exhibited significantly better photoelectrochemical response than the unirradiated α-Fe2O3 sample. Photocurrent density was observed to increase at lower ion fluence and the film irradiated at a fluence of 5 × 1012 ions/cm2 exhibited maximum photocurrent density. Crystallinity of the films and particle size were also observed to increase after irradiation up to this fluence. The irradiation caused a decrease in the resistivity, increase in donor density and increase in flatband potential for the sample irradiated at fluence 5 × 1012 ions/cm2, which may be responsible for its better photoelectrochemical properties. Rate of hydrogen as measured for best performing electrode was 2.4 mL/h-cm2.
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