Photoelectric properties of ZnO/CuPc/Si structures

Abstract

n-ZnO:Al/CuPc/n(p)-Si structures were formed using vacuum-evaporation deposition of copper phthalocyanine (CuPc) layers on the surface of n-and p-Si wafers with subsequent magnetron-sputtering deposition of ZnO:Al layers on the CuPc surface. It is shown that the structures obtained exhibit a high photosensitivity (∼80 V/W at T=300 K) in the spectral range 1.65–3.3 eV. The rectification factor and photovoltaic effect in these structures are discussed in relation to the properties of silicon substrates. It is concluded that the contact of phthalocyanine with diamond-like semiconductors (e.g., silicon) are promising for application in wide-band high-efficiency photovoltaic converters.