Abstract
Photodiodes of InSb were fabricated on an epitaxial layer grown using molecular beam epitaxy (MBE). Thermal cleaning of the InSb (001) substrate surface, 2° towards the (111) B plane, was performed to remove the oxide. Photodiode properties of МВЕ-formed epitaxial InSb were demonstrated. Zero-bias resistance area product (R0A) measurements were taken at 80K under room temperature background for a pixel size of 100μm×100μm. Values were as high as 4.36×104Ω/cm2, and the average value of R0A was 1.66×104Ω/cm2. The peak response was 2.44(A/W). The epitaxial InSb photodiodes were fabricated using the same process as bulk crystal InSb diodes with the exception of the junction formation method. These values are comparable to the properties of bulk crystal InSb photodiodes.
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