Abstract
Phenyl isopropenyl ketone (PIPK) was terpolymerized with styrene and n-butyl acrylate. Clear 1.6 μm thick polymer layers coated on glass plates were found to be removed by 2–3 times of repeated cycles of 254 nm or 222 nm deep ultraviolet irradiation for 3 min at 80–120°C and brushing-off. The polymer layer irradiated under some conditions could not be detached from the substrate, and crosslinking was observed to take place in parallel with degradation during the irradiation. From the experiments with PIPK-methyl methacrylate copolymer as a model polymer, the optimum PIPK content for easy detaching was found to be around 11 mol%. Further, the preferable light source and irradiation temperature were determined for effective photodegradation with suppressing photocrosslinking, and the reaction scheme was elucidated from UV-spectral and molecular-weight changes and quantum yields for benzoyl side-group removal and for main-chain scission.
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