Abstract
Atomic layer deposition was used to coat CdS photoanodes with 7 nm thick TiO2films to protect them from photocorrosion during photoelectrochemical water splitting. Photoelectrochemical measurements indicate that the TiO2coating does not provide full protection against photocorrosion. The degradation of the film initiates from small pinholes and shows oscillatory behavior that can be explained by an Avrami-type model for photocorrosion that is halfway between 2D and 3D etching. XPS analysis of corroded films indicates that a thin layer of CdS remains present on the surface of the corroded photoanode that is more resilient towards photocorrosion.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
