Abstract
The photostabilization of poly(methyl methacrylate) (PMMA) films having 2-(6-methoxynaphthalen-2-yl)propanoate and Sn(II), Ni(II), Zn(II) and Cu(II) complexes was investigated. The production of PMMA films containing such complexes (0.5% by weight) was carried out by the casting method using chloroform. The photostabilization activities of the compounds were determined by monitoring the hydroxyl index with irradiation time. The quantum yield of the chain scission (Φcs) for the complexes in PMMA films and the changes in the viscosity average molecular weight of PMMA with irradiation time were evaluated. The rate of photostabilization for PMMA in the presence of the additives was found to follow the order NiL2 > CuL2 > ZnL2 > SnL2 (L, ligand). Depending on the structure of the additive, such as a peroxide decomposer, UV absorption or a radical scavenger for the photostabilizer, several mechanisms are suggested.
Highlights
Ultraviolet radiation (UV) can cause degradation of certain materials if exposed
A ultraviolet absorbers (UVAs) can be incorporated into a material to protect such a material from UV radiation, or a composition that contains UVA can be applied to a UV-sensitive substrate to protect the substrate
As part of our on-going research on the synthesis of polymeric materials [15,16,17,18] and polymer stabilization [19,20], we became interested in the photostabilization of poly(methyl methacrylate) (PMMA) using 2-(6-methoxynaphthalen-2-yl)propanoate with Sn(II), Ni(II), Zn(II) and Cu(II) complexes
Summary
Ultraviolet radiation (UV) can cause degradation of certain materials if exposed. Chemical materials, known as ultraviolet absorbers (UVAs) can be used to protect materials from the damaging effects of UV radiation. Ultraviolet light stabilizers are used in important materials, including films, plastics and cosmetics [1]. There are several types of ultraviolet light stabilizers that contain organic and inorganic moieties. The addition of organic UV-stabilizers to plastic materials creates many problems, such as incompatibility, volatility, migration and solvent extraction. Such problems could lead to strong diminution of the material utilized. As part of our on-going research on the synthesis of polymeric materials [15,16,17,18] and polymer stabilization [19,20], we became interested in the photostabilization of PMMA using 2-(6-methoxynaphthalen-2-yl)propanoate with Sn(II), Ni(II), Zn(II) and Cu(II) complexes. To the best of our knowledge, this is the first attempt to investigate the photostabilization of PMMA films by complexes containing a naphthalene moiety
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