Abstract

1. The photochemical processes in solid glassy solutions of triphenyl derivatives of elements of group IIIB under the action of near UV light at 77°K were investigated by the methods of low-temperature spectrophotometry and ESR. In these molecular systems, there is an accumulation of radicals of the matrix, which depends on the nature of the elements and the solvent. 2. The largest yield of stabilized radicals of the matrix is observed for aromatic derivatives of boron. 3. The photosensitizing ability of aromatic derivatives of Al and Ga with respect to the formation of stable radicals of the matrix decreases as a result of the occurrence of competing processes of photodissociation of the dissolved compounds at the C-M bond and complex formation with the donor solvent.

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