Abstract
Large area photochemical surface modification and dry etching of undoped polytetrafluoroethylene (PTFE) with incoherent excimer VUV and UV sources are reported for the first time. The etch rate of PTFE was determined as a function of the VUV/UV intensity and exposure time at different wavelengths λ = 172 nm and λ = 222 nm. The surface morphology of the exposed PTFE was investigated with scanning electron microscopy (SEM). The results are compared with those obtained by excimer laser experiments.
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