Abstract
Titanium oxide-based photocatalytic films and their application have been the subject of growing interest in recent years. Properties of these films are significantly influenced by applied deposition methods. This article is focused on varying parameters of the plasma-enhanced chemical vapor deposition method and their influence on resulting thin titanium oxide films. Depositions were carried out with varying bias, substrate temperature and substrate type. Resulting samples of titanium oxide films were tested for their photocatalytic properties. The test method was based on decomposition of model organic substance, acid orange II. The film thickness was measured by a mechanical profiler.
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