Abstract

The present study demonstrates that H 2SO 4 treatment of TiO 2 surface provides higher photocatalytic decomposition efficiency on gaseous toluene under a proper condition. Deactivation was less remarkable for H 2SO 4-treated TiO 2 than for pure TiO 2 with repeated toluene injections. This result is attributable to the assist of the decomposition of intermediates by surface strong acid itself or resultant high quantum yield by decreasing recombination possibility between electrons and holes on the powder surface.

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