Photocatalytic degradation rate of oxalic acid on the semiconductive layer of n-TiO 2 particles in the batch mode plate reactor Part I: Mass transfer limits

Abstract

Organic compounds dissolved in water can be decomposed on a layer of n-TiO2 particles irradiated by u.v. light, which generates holes and electrons in the TiO2 material. Dissolved oxygen was used as electron scavenger and holes reacted with water to give OH radicals. The rate of degradation of the dissolved organic compounds by OH radicals is limited by the transfer of either oxygen or of theorganic compounds to the surface of n-TiO2 particles. The consequence of these limits is that, in the batch mode reactor with recirculation of the liquid, the dependence of the concentration of an organic compound on time has either a linear or an exponential form. Experiments with decomposition of oxalic acid in aqueous solutions using a plate reactor (60 cm × 120 cm) confirmed the analysis. Equations for evaluation of the mass transfer coefficient of the dissolved species to the surface of the plate reactor with a moving liquid fil m were developed for the case of the thickness of the Nernst diffusion layer being thinner than the thickness of the liquid. The experimentally obtained decomposition rate of oxalic acid was about 60 to 80% of the theoretical decomposition rate limited by oxygen flux through the film of a moving liquid. The present theory neglects the diffusion of oxygen into the porous layer of n-TiO2.