Abstract
AbstractFacile sulfation of TiO2 semiconductor photocatalyst was achieved by a simple grinding and calcination method using elemental sulfur from desulfurization of petroleum. The successful sulfation of the prepared visible‐light‐active photocatalyst was also proved by infrared and X‐ray photoelectron spectroscopic measurements. Photocatalytic tests revealed that the most efficient member of the series has higher photocatalytic activity than TiO2 in the photodegradation of formic acid under both UV and visible‐light activation. Moreover, the improved electrokinetic and water dispersibility behaviors of the sulfur‐modified photocatalyst allowed the preparation of polyacrylate‐based photoreactive thin films with increased photocatalytic activity, strong antimicrobial properties, and improved mechanical behavior.
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