Abstract
TiO2 films were deposited on the native oxide covered Si(100) with ALD method. The films were grown applying various numbers of deposition cycles at different temperatures. The resulting coatings possessed different thickness, crystallinity, morphology and roughness. The photocatalytic activity of the films has been studied in the presence of terephthalic acid, Azur B and two herbicides: 2,4-dichlorophenoxyacetic acid and 2,4,5-trichlorophenoxyacetic acid. Coatings deposited at 350°C (anatase–rutile composites) show the highest activity in the process of TA oxidation (the highest efficiency of hydroxyl radical generation). The influence of film thickness on photoactivity is more complex and depends on the mechanism of processes to be photocatalysed.
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