Photocatalytic activity of dc magnetron sputter deposited amorphous TiO 2 thin films

Abstract

For photocatalytic thin film applications TiO 2 is one of the most important materials. The most studied TiO 2 crystal phase is anatase, though also rutile and brookite show good photoactivity. Usually anatase or a mixture of rutile and anatase is applied for powder or thin film catalysts. It has been claimed that amorphous films do not exhibit any or only a very low photocatalytic activity. We have deposited amorphous thin films by dc magnetron sputtering from sub-stoichiometric TiO 2− x targets. The coatings are transparent and show a photocatalytic activity half of that of a thin layer of spin-coated reference photocatalyst powder. Annealing the thin films to yield anatase crystallization more than doubles their photocatalytic activity. At the same film thickness these thin films show the same activity as a commercially available photocatalytic coating. The dependence of the photocatalytic activity on deposition parameters like gas pressure and sputter power is discussed. A decrease in film density, as deduced from the refractive index and the microstructure, resulted in an increase in photocatalytic activity. Film thickness has a marked influence on the photocatalytic activity, showing a strong increase up to 300–400 nm, followed by a much shallower slope.