Abstract
We describe a dye system that is particularly useful for resolution enhancement in optical lithography because of the possibility of complete separation of dye and resist exposures, and because of its utility in the deep UV spectral region. Substantial variations in reactivity occur in connection with the substituents of the anthracene nucleus, the type of polymer matrix, the presence of sensitizers, and binding of the anthracene to the polymer backbone. The best results are obtained with small alkyl substituents and an external sensitizer. Variations are also observed in deep UV behavior. Novel reactions occurring in the absence of oxygen are described; these are intensity and wavelength dependent and presumably involve highly excited states. It is probable that these reactions lead to the crosslinking of some anthracene-containing polymers.
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