Abstract
In this paper the first demonstration of the photo-etching of polymethyl methacry late (PMMA) by using a high power excimer laser in the ultraviolet has been carried out.The irradiating la erenergies necessary for obtaining a certain etching depth decreased abruptly by increasing the irradiating power.These experimental results show the excimer lasers are the effectiYe light sources for the ultraviolet photo-etching and also far ultraviolet lithography.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
