Abstract
Radical polymerization of methyl methacrylate (2) as major component and the methacrylates 1a or 1b, which contain an (E)-stilbene unit fixed by a tether to the ester group, yield easily soluble copolymers 3a, b. Whereas the dominant photoreactions in solution are (E)⇄Z) isomerizations and intra-chain [2π +2π] cycloadditions, cast films of 3a, b give an inter-chain photo-crosslinking on irradiation. Compared to homopolymers, the copolymers are not only better soluble and more easily processible, their films show less undesired light scattering. The cross-linked material is completely insoluble in organic solvents. Thus, it represents the basis for negative photoresists and the corresponding imaging techniques.
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