Abstract
We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH 3(N(CH 3) 3) 2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.
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