Abstract
A novel reactive gas impulse magnetron sputtering (GIMS) technique was applied in order to deposit titanium dioxide coatings. A small volume magnetron sputtering reactor was used for that purpose, wherein titanium target was reactively sputtered under a pure oxygen atmosphere. The process resulted in a high quality nearly stoichiometric and fairly crystalline TiO2 films with a prevailing content of rutile. The coatings exhibit a strong photowetting effect – it takes 25 min of illumination with UV-C radiation to arrive at their “superhydrophilic” behaviour. In addition, in the discussed process of reactive GIMS deposition of titanium dioxide films, no target poisoning effect has been observed.
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