Abstract

Doping in semiconductors is a fundamental issue for developing high performance devices. However, the doping behavior in Si nanocrystals (Si NCs) has not been fully understood so far. In the present work, P-doped Si NCs/SiO2 multilayers are fabricated. As revealed by XPS and ESR measurements, P dopants will preferentially passivate the surface states of Si NCs. Meanwhile, low temperature ESR spectra indicate that some P dopants are incorporated into Si NCs substitutionally and the incorporated P impurities increase with the P doping concentration or annealing temperature increasing. Furthermore, a kind of defect states will be generated with high doping concentration or annealing temperature due to the damage of Si crystalline lattice. More interestingly, the incorporated P dopants can generate deep levels in the ultra-small sized (~2 nm) Si NCs, which will cause a new subband light emission with the wavelength compatible with the requirement of the optical telecommunication. The studies of P-doped Si NCs/SiO2 multilayers suggest that P doping plays an important role in the electronic structures and optoelectronic characteristics of Si NCs.

Highlights

  • On the other hand, light emission from Si nanocrystals (Si NCs) is an interesting topic because it can be potentially applied in the Si-based monolithic optoelectronic integrations[20,21,22]

  • Phosphorus-doped (P-doped) Si NCs/SiO2 multilayers were prepared by annealing amorphous P-doped Si/SiO2 stacked structures and the doping behaviors of P atoms were systematically studied by controlling the P doping concentrations and annealing temperatures

  • By the Raman and depth-profile X-ray photoelectron spectroscopy (XPS) measurements, it is demonstrated that P-doped Si NCs/SiO2 multilayers are obtained after annealing and P atoms are located in the Si layer or at the Si/SiO2 interface

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Summary

Introduction

Light emission from Si NCs is an interesting topic because it can be potentially applied in the Si-based monolithic optoelectronic integrations[20,21,22]. Though the indirect bandgap has excluded the bulk Si as a good choice for light emitting material, strong luminescence from the Si NCs has been reported owing to the enhanced radiative recombination probability of electron-hole pairs caused by the quantum confinement www.nature.com/scientificreports/. The quantum confinement effect will enlarge the bandgap of Si NCs compared to its bulk value (~1.1 eV), which causes the emission wavelength blueshift to the visible light region. It was reported that the subband light emission can be obtained in impurity-doped Si NCs, which provided a new approach to get the Si-based light emitter with the suitable wavelength[27,28]. The wavelength of the emission light meets the requirements of optical telecommunication, which makes P-doped Si NCs a potential material for the monolithic optoelectronic integrations

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