Phase-resolved profiles of electron energy deposition in inductively coupled radio-frequency plasmas driven under confronting divergent magnetic fields

Abstract

Electron motion in a cylindrical chamber under RF electric field and confronting divergent magnetic fields was simulated to evaluate the phase-resolved profiles of power deposition to electrons in a low-pressure inductively coupled magnetized plasma. There were three primary regions where the power deposition was high; a region near the RF antenna, a region near the sidewall, and a region of the partial resonance. The phase-resolved profiles of the electron energy gain G(t) and azimuthal electron velocity vθ(t) were obtained in every section defined in the chamber, and were fitted by functions with sinusoidal terms. The characteristics of G(t) and vθ(t), e.g. their asymmetry and directionality, particular to the position were discussed by comparisons between different regions with the fitting parameters and their factors, such as the amplitude of electric field, that of the azimuthal velocity, the power factor, and the phase differences from the RF electric field.