Phase-induced amplitude apodization complex mask coronagraph mask fabrication, characterization, and modeling for WFIRST-AFTA

Abstract

This work describes the fabrication, characterization, and modeling of a second-generation occulting mask for a phase-induced amplitude apodization complex mask coronagraph, designed for use on the WFIRST-AFTA mission. The mask has many small features (∼micron lateral scales) and was fabricated at the Jet Propulsion Laboratory Microdevices Laboratory, then characterized using a scanning electron microscope, atomic force microscope, and optical interferometric microscope. The measured fabrication errors were then fed to a wavefront control model which predicts the contrast performance of a full coronagraph. The expected coronagraphic performance using this mask is consistent with observing ∼15 planetary targets with WFIRST-AFTA in a reasonable time (<1 day/target).